Nitride etching equipment
  • Our line heater and chemical bath are incorporated.
  • Silicon nitride film, which is indispensable for the semiconductor manufacturing process, is removed with high-temperature phosphoric acid.
  • The dryer is equipped with our spin dryer.
Fully automatic wet etching equipment
  • Wet etching system with two transfer arms for chemical etching, washing with water and drying.
  • An ultrasonic generator is attached.
  • The dryer is equipped with our spin dryer.
  • It can handle from 5 inches to 12 inches.
Fully automatic organic solvent etching equipment
  • The transfer arm automatically transfers the cassette to process the wafer.
Quartz tube cleaning equipment
  • The quartz tube used in the drying equipment is automatically cleaned.