Example of development product line｜Product Introduction｜Semiconductor manufacturing equipment design, washer/dryer manufacturer Chemical Art Technology

Product Introduction

Product introduction

	Aqua static cleaning/drying equipment<Co-patented product with Canon>
It efficiently cleans and dries the inside (10nm-) of the extremely small holes such as trenches, via holes, and contact holes, etc., which was difficult with conventional cleaning and drying technology. It performs IPA treatment/DIW treatment under reduced pressure in the sealed chamber for chemical liquid (liquid component) inside the micro-hole after chemical liquid treatment and reliably replaces rinse with pressure under pressure. After rinsing with DIW, nitrogen is supplied to create a vacuum break, making it possible to reliably dry the inside of the tiny holes. This is developed by the unique technology of our company.

Aqua static cleaning/drying equipment<Co-patented product with Canon>

It efficiently cleans and dries the inside (10nm-) of the extremely small holes such as trenches, via holes, and contact holes, etc., which was difficult with conventional cleaning and drying technology.
It performs IPA treatment/DIW treatment under reduced pressure in the sealed chamber for chemical liquid (liquid component) inside the micro-hole after chemical liquid treatment and reliably replaces rinse with pressure under pressure.
After rinsing with DIW, nitrogen is supplied to create a vacuum break, making it possible to reliably dry the inside of the tiny holes. This is developed by the unique technology of our company.